Invention Grant
US09074055B2 Method of manufacturing nanostructure and method of forming pattern using the same
有权
制造纳米结构的方法和使用其形成图案的方法
- Patent Title: Method of manufacturing nanostructure and method of forming pattern using the same
- Patent Title (中): 制造纳米结构的方法和使用其形成图案的方法
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Application No.: US13870473Application Date: 2013-04-25
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Publication No.: US09074055B2Publication Date: 2015-07-07
- Inventor: Eun-Ae Kwak , Min-Hyuck Kang , Su Mi Lee , Jun Han Lee , Moon Gyu Lee , Joona Bang , Hyun Jung Jung
- Applicant: Samsung Display Co., Ltd. , KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
- Applicant Address: KR Yongin KR Seoul
- Assignee: Samsung Display Co., Ltd.,Korea University Research and Business Foundation
- Current Assignee: Samsung Display Co., Ltd.,Korea University Research and Business Foundation
- Current Assignee Address: KR Yongin KR Seoul
- Agency: H.C. Park & Associates, PLC
- Priority: KR10-2012-0141737 20121207
- Main IPC: C03C15/00
- IPC: C03C15/00 ; C08J7/04 ; G03F7/00 ; G03F7/26
Abstract:
An approach is provided for manufacturing a nanostructure. A first thin film including a first block copolymer is formed on a substrate. A guide pattern is formed on the first thin film. A second thin film including a second block copolymer is formed between portions of the guide pattern. The second thin film is cured. The first block copolymer is a cylinder-type and the second block copolymer is a lamella-type.
Public/Granted literature
- US20140158664A1 METHOD OF MANUFACTURING NANOSTRUCTURE AND METHOD OF FORMING PATTERN USING THE SAME Public/Granted day:2014-06-12
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