Invention Grant
- Patent Title: Capacitors using porous alumina structures
- Patent Title (中): 使用多孔氧化铝结构的电容器
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Application No.: US13797540Application Date: 2013-03-12
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Publication No.: US09076594B2Publication Date: 2015-07-07
- Inventor: Rajesh Katkar , Cyprian Emeka Uzoh
- Applicant: Invensas Corporation
- Applicant Address: US CA San Jose
- Assignee: Invensas Corporation
- Current Assignee: Invensas Corporation
- Current Assignee Address: US CA San Jose
- Agency: Lerner, David, Littenberg, Krumholz & Mentlik, LLP
- Main IPC: H01G4/06
- IPC: H01G4/06 ; H01G4/08 ; H01G4/01 ; H01G4/10 ; H01L49/02 ; H01M4/80

Abstract:
Capacitors and methods of making the same are disclosed herein. In one embodiment, a capacitor comprises a structure having first and second oppositely facing surfaces and a plurality of pores each extending in a first direction from the first surface towards the second surface, and each having pore having insulating material extending along a wall of the pore; a first conductive portion comprising an electrically conductive material extending within at least some of the pores; and a second conductive portion comprising a region of the structure consisting essentially of aluminum surrounding individual pores of the plurality of pores, the second conductive portion electrically isolated from the first conductive portion by the insulating material extending along the walls of the pores.
Public/Granted literature
- US20140268491A1 CAPACITORS USING POROUS ALUMINA STRUCTURES Public/Granted day:2014-09-18
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