Invention Grant
- Patent Title: Method and structures for via substrate repair and assembly
- Patent Title (中): 通孔基板修复和组装的方法和结构
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Application No.: US13711042Application Date: 2012-12-11
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Publication No.: US09076785B2Publication Date: 2015-07-07
- Inventor: Cyprian Emeka Uzoh
- Applicant: Invensas Corporation
- Applicant Address: US CA San Jose
- Assignee: Invensas Corporation
- Current Assignee: Invensas Corporation
- Current Assignee Address: US CA San Jose
- Agency: Lerner, David, Littenberg, Krumholz & Mentlik, LLP
- Main IPC: H01L23/04
- IPC: H01L23/04 ; H01L23/498

Abstract:
A component can include a substrate having an opening extending between first and second surfaces thereof, and an electrically conductive via having first and second portions. The first portion can include a first layer structure extending within the opening and at least partially along an inner wall of the opening, and a first principal conductor extending within the opening and at least partially overlying the first layer structure. The first portion can be exposed at the first surface and can have a lower surface located between the first and second surfaces. The second portion can include a second layer structure extending within the opening and at least partially along the lower surface of the first portion, and a second principal conductor extending within the opening and at least partially overlying the second layer structure. The second portion can be exposed at the second surface.
Public/Granted literature
- US20140159249A1 METHOD AND STRUCTURES FOR VIA SUBSTRATE REPAIR AND ASSEMBLY Public/Granted day:2014-06-12
Information query
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