- 专利标题: Graphene devices with local dual gates
-
申请号: US12986342申请日: 2011-01-07
-
公开(公告)号: US09076873B2公开(公告)日: 2015-07-07
- 发明人: Zhihong Chen , Aaron Daniel Franklin , Shu-Jen Han
- 申请人: Zhihong Chen , Aaron Daniel Franklin , Shu-Jen Han
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Ryan, Mason & Lewis, LLP
- 代理商 Vazken Alexanian
- 主分类号: H01L29/66
- IPC分类号: H01L29/66 ; H01L29/786 ; H01L29/16 ; H01L29/49
摘要:
An electronic device comprises an insulator, a local first gate embedded in the insulator with a top surface of the first gate being substantially coplanar with a surface of the insulator, a first dielectric layer formed over the first gate and insulator, and a channel. The channel comprises a bilayer graphene layer formed on the first dielectric layer. The first dielectric layer provides a substantially flat surface on which the channel is formed. A second dielectric layer formed over the bilayer graphene layer and a local second gate formed over the second dielectric layer. Each of the local first and second gates is capacitively coupled to the channel of the bilayer graphene layer. The local first and second gates form a first pair of gates to locally control a first portion of the bilayer graphene layer.
公开/授权文献
- US20120175594A1 Graphene Devices with Local Dual Gates 公开/授权日:2012-07-12
信息查询
IPC分类: