发明授权
- 专利标题： Liquid ejecting method and liquid ejecting apparatus
- 专利标题（中）： 液体喷射方法和液体喷射装置
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申请号： US14084496申请日： 2013-11-19
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公开(公告)号： US09079419B2公开(公告)日： 2015-07-14
- 发明人: Kinya Ozawa
- 申请人： SEIKO EPSON CORPORATION
- 申请人地址： JP Tokyo
- 专利权人： Seiko Epson Corporation
- 当前专利权人： Seiko Epson Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Workman Nydegger
- 优先权： JP2010-062165 20100318
- 主分类号： B41J11/00
- IPC分类号： B41J11/00 ; B41J2/21 ; B41J2/135
摘要：
After a gloss-based liquid is ejected from a liquid ejection head, which ejects liquid from nozzles of a nozzle row, to a predetermined position on a landing target to form a glossy layer, a white-based liquid is ejected onto the glossy layer to form a white layer, the ejection amount of the gloss-based liquid being greater than the ejection amount of the white-based liquid.
公开/授权文献
- US20140078218A1 LIQUID EJECTING METHOD AND LIQUID EJECTING APPARATUS 公开/授权日：2014-03-20
信息查询
IPC分类:
