发明授权
US09082803B2 Substrate holding apparatus, mask alignment method, and vacuum processing apparatus using long taper pins and short taper pins for alignment
有权
基板保持装置，掩模对准方法和使用长锥销和用于对准的短锥销的真空处理装置
- 专利标题： Substrate holding apparatus, mask alignment method, and vacuum processing apparatus using long taper pins and short taper pins for alignment
- 专利标题（中）： 基板保持装置，掩模对准方法和使用长锥销和用于对准的短锥销的真空处理装置
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申请号： US12850706申请日： 2010-08-05
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公开(公告)号： US09082803B2公开(公告)日： 2015-07-14
- 发明人: Yoshimitu Shimane , Nobuo Yamaguchi
- 申请人： Yoshimitu Shimane , Nobuo Yamaguchi
- 申请人地址： JP Kawasaki-shi
- 专利权人： CANON ANELVA CORPORATION
- 当前专利权人： CANON ANELVA CORPORATION
- 当前专利权人地址： JP Kawasaki-shi
- 代理机构： Fitzpatrick, Cella, Harper & Scinto
- 优先权： JP2009-193748 20090825
- 主分类号： H01L21/68
- IPC分类号： H01L21/68 ; C23C14/04 ; H01J37/34
摘要：
A mask alignment method for a substrate holding apparatus. A first engaging portion is formed in one of a substrate holder and a mask and has two protruding portions. A second engaging portion is formed in the other one of the substrate holder and the mask and has at least one protruding portion. First groove portions formed in the other one of the substrate holder and the mask engage with the protruding portions of the first engaging portion. A second groove portion formed in the other one of the substrate holder and the mask engages with the protruding portion of the second engaging portion. The mask alignment method includes the steps of (a) engaging the protruding portions of the first engaging portion with the first groove portions to align the mask with respect to the substrate holder in a first direction, and (b) engaging, after the step of engaging the protruding portions of the first engaging portion with the first groove portions, the protruding portion of the second engaging portion with the second groove portion, to align the mask with respect to the substrate holder in a direction perpendicular to the first direction.