Invention Grant
- Patent Title: Split-gate type nonvolatile memory device, semiconductor device having split-type nonvolatile memory device embedded therein, and methods of forming the same
- Patent Title (中): 分离式非易失性存储装置,嵌有分离式非易失性存储装置的半导体装置及其形成方法
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Application No.: US13743445Application Date: 2013-01-17
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Publication No.: US09082865B2Publication Date: 2015-07-14
- Inventor: Tea-Kwang Yu , Kwang-Tae Kim , Yong-Tae Kim , Bo-Young Seo , Yong-Kyu Lee , Hee-Seog Jeon
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec, P.A.
- Priority: KR10-2012-0025643 20120313
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/788 ; G11C16/04 ; H01L29/10 ; H01L27/115

Abstract:
A split-gate type nonvolatile memory device includes a semiconductor substrate having a first conductivity type, a deep well having a second conductivity type in the semiconductor substrate, a pocket well having the first conductivity type in the deep well, a source line region having the second conductivity type in the pocket well, an erase gate on the source line region, and a first floating gate and a first control gate stacked sequentially on the pocket well on a side of the erase gate. The pocket well is electrically isolated from the substrate by the deep well, so that a negative voltage applied to the pocket well may not adversely affect operation of other devices formed on the substrate.
Public/Granted literature
Information query
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