发明授权
US09087679B2 Uniformity tuning capable ESC grounding kit for RF PVD chamber
有权
用于RF PVD室的均匀调谐ESC接地套件
- 专利标题： Uniformity tuning capable ESC grounding kit for RF PVD chamber
- 专利标题（中）： 用于RF PVD室的均匀调谐ESC接地套件
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申请号： US13365876申请日： 2012-02-03
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公开(公告)号： US09087679B2公开(公告)日： 2015-07-21
- 发明人: Muhammad M. Rasheed , Rongjun Wang , Thanh X. Nguyen , Alan A. Ritchie
- 申请人： Muhammad M. Rasheed , Rongjun Wang , Thanh X. Nguyen , Alan A. Ritchie
- 申请人地址： US CA Santa Clara
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Patterson & Sheridan, LLP
- 主分类号： C23C14/34
- IPC分类号： C23C14/34 ; H01J37/34 ; H01J37/32
摘要：
Embodiments of the invention generally relate to a grounding kit for a semiconductor processing chamber, and a semiconductor processing chamber having a grounding kit. More specifically, embodiments described herein relate to a grounding kit which creates an asymmetric grounding path selected to significantly reduce the asymmetries caused by an off center RF power delivery.