Invention Grant
- Patent Title: Multipurpose combinatorial vapor phase deposition chamber
- Patent Title (中): 多功能组合气相沉积室
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Application No.: US14135307Application Date: 2013-12-19
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Publication No.: US09087864B2Publication Date: 2015-07-21
- Inventor: Chen-An Chen , Tony P. Chiang , Frank Greer , Martin Romero , James Tsung
- Applicant: Intermolecular, Inc.
- Applicant Address: US CA San Jose
- Assignee: Intermolecular, Inc.
- Current Assignee: Intermolecular, Inc.
- Current Assignee Address: US CA San Jose
- Main IPC: H01L21/31
- IPC: H01L21/31 ; H01L21/469 ; H01L21/677 ; H01L21/02
Abstract:
In some embodiments, apparatus are provided that provide for flexible processing in high productivity combinatorial (HPC) system. The apparatus allow for interchangeable functionality that includes deposition, plasma treatment, ion beam treatment, in-situ annealing, and in-situ metrology. The apparatus are designed so that the functionality may be integrated within a single processing chamber for enhanced flexibility.
Public/Granted literature
- US20150179487A1 Multipurpose Combinatorial Vapor Phase Deposition Chamber Public/Granted day:2015-06-25
Information query
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