发明授权
- 专利标题: Elongated bump structure for semiconductor devices
- 专利标题(中): 半导体器件的凸起凸块结构
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申请号: US13023011申请日: 2011-02-08
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公开(公告)号: US09093332B2公开(公告)日: 2015-07-28
- 发明人: Tin-Hao Kuo , Yu-Feng Chen , Chen-Shien Chen , Chen-Hua Yu , Sheng-Yu Wu , Chita Chuang
- 申请人: Tin-Hao Kuo , Yu-Feng Chen , Chen-Shien Chen , Chen-Hua Yu , Sheng-Yu Wu , Chita Chuang
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsin-Chu
- 代理机构: Slater & Matsil, L.L.P.
- 主分类号: H01L23/48
- IPC分类号: H01L23/48 ; H01L23/00 ; H01L23/31
摘要:
An elongated bump structure for semiconductor devices is provided. An uppermost protective layer has an opening formed therethrough. A pillar is formed within the opening and extending over at least a portion of the uppermost protective layer. The portion extending over the uppermost protective layer exhibits a generally elongated shape. In an embodiment, the position of the opening relative to the portion of the bump structure extending over the uppermost protective layer is such that a ratio of a distance from an edge of the opening to an edge of the bump is greater than or equal to about 0.2. In another embodiment, the position of the opening is offset relative to center of the bump.
公开/授权文献
- US20120199966A1 Elongated Bump Structure for Semiconductor Devices 公开/授权日:2012-08-09
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