发明授权
- 专利标题: Metal foil having electrical resistance layer, and manufacturing method for same
- 专利标题(中): 具有电阻层的金属箔及其制造方法
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申请号: US14008254申请日: 2012-03-27
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公开(公告)号: US09099229B2公开(公告)日: 2015-08-04
- 发明人: Toshio Kurosawa
- 申请人: Toshio Kurosawa
- 申请人地址: JP Tokyo
- 专利权人: JX Nippon Mining & Metals Corporation
- 当前专利权人: JX Nippon Mining & Metals Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Marshall, Gerstein & Borun LLP
- 优先权: JP2011-070760 20110328
- 国际申请: PCT/JP2012/057979 WO 20120327
- 国际公布: WO2012/133439 WO 20121004
- 主分类号: H01C1/012
- IPC分类号: H01C1/012 ; H01C7/00 ; C23C14/02 ; C23C14/16 ; B32B15/01 ; C22C19/05 ; H05K1/16 ; C22C1/02 ; H05K1/09 ; H05K3/02
摘要:
The present invention provides a metal foil provided with an electrical resistance layer, in which peeling between the metal foil and the electrical resistance layer disposed on the metal foil can be prevented and variation in the resistivity of the resistance layer can be reduced, and a method of manufacturing the same. The present invention includes a metal foil with an electrical resistance layer including a metal foil having a surface of a ten-point mean roughness Rz, which is measured by an optical method according to 1 μm or less and the surface being treated by irradiation with ion beams at an ion beam intensity of 0.70-2.10 sec·W/cm2 and an electrical resistance layer disposed on the surface of the metal foil.
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