发明授权
US09099354B2 Transistors with various levels of threshold voltages and absence of distortions between nMOS and pMOS 有权
具有各种阈值电压水平和不存在nMOS和pMOS之间失真的晶体管

Transistors with various levels of threshold voltages and absence of distortions between nMOS and pMOS
摘要:
The invention relates to an integrated circuit comprising a semi-conducting substrate and first and second cells. Each cell comprises first and second transistors of nMOS and pMOS type including first and second gate stacks including a gate metal. There are first and second ground planes under the first and second transistors and an oxide layer extending between the transistors and the ground planes. The gate metals of the nMOS and of a pMOS exhibit a first work function and the gate metal of the other pMOS exhibiting a second work function greater than the first work function. The difference between the work functions is between 55 and 85 meV and the first work function Wf1 satisfies the relation Wfmg−0.04−0.005*Xge
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