Invention Grant
US09099386B2 Laser annealing method, laser annealing apparatus, and method for manufacturing thin film transistor
有权
激光退火方法,激光退火装置以及薄膜晶体管的制造方法
- Patent Title: Laser annealing method, laser annealing apparatus, and method for manufacturing thin film transistor
- Patent Title (中): 激光退火方法,激光退火装置以及薄膜晶体管的制造方法
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Application No.: US13785400Application Date: 2013-03-05
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Publication No.: US09099386B2Publication Date: 2015-08-04
- Inventor: Tsutomu Kakuno , Ryuichi Togawa , Hiroshi Ito
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2012-057269 20120314
- Main IPC: H01L21/20
- IPC: H01L21/20 ; H01L21/263 ; B23K26/00 ; B23K26/073 ; B23K26/08 ; C30B1/02 ; C30B28/08 ; C30B29/06 ; C30B35/00 ; H01L21/268

Abstract:
According to one embodiment, a laser annealing method includes: detecting an intensity distribution of a laser light formed as a line beam by a line beam optical system; dividing width in short axis direction of the line beam in the detected intensity distribution by number of times of the irradiation per one site and partitioning the width; and calculating increment of crystal grain size of a non-crystalline thin film for energy density corresponding to wave height of the partitioned intensity distribution, and summing the increments by number of times of pulse irradiation, when energy density of the laser light is larger than a threshold, the crystal grain size of the non-crystalline thin film taking a downward turn at the threshold, the increment summed before the energy density exceeds the threshold being set to zero.
Public/Granted literature
- US20130244347A1 LASER ANNEALING METHOD, LASER ANNEALING APPARATUS, AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR Public/Granted day:2013-09-19
Information query
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