发明授权
US09099386B2 Laser annealing method, laser annealing apparatus, and method for manufacturing thin film transistor
有权
激光退火方法,激光退火装置以及薄膜晶体管的制造方法
- 专利标题: Laser annealing method, laser annealing apparatus, and method for manufacturing thin film transistor
- 专利标题(中): 激光退火方法,激光退火装置以及薄膜晶体管的制造方法
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申请号: US13785400申请日: 2013-03-05
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公开(公告)号: US09099386B2公开(公告)日: 2015-08-04
- 发明人: Tsutomu Kakuno , Ryuichi Togawa , Hiroshi Ito
- 申请人: Kabushiki Kaisha Toshiba
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2012-057269 20120314
- 主分类号: H01L21/20
- IPC分类号: H01L21/20 ; H01L21/263 ; B23K26/00 ; B23K26/073 ; B23K26/08 ; C30B1/02 ; C30B28/08 ; C30B29/06 ; C30B35/00 ; H01L21/268
摘要:
According to one embodiment, a laser annealing method includes: detecting an intensity distribution of a laser light formed as a line beam by a line beam optical system; dividing width in short axis direction of the line beam in the detected intensity distribution by number of times of the irradiation per one site and partitioning the width; and calculating increment of crystal grain size of a non-crystalline thin film for energy density corresponding to wave height of the partitioned intensity distribution, and summing the increments by number of times of pulse irradiation, when energy density of the laser light is larger than a threshold, the crystal grain size of the non-crystalline thin film taking a downward turn at the threshold, the increment summed before the energy density exceeds the threshold being set to zero.
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