Invention Grant
- Patent Title: Silicon texturing formulations
- Patent Title (中): 硅纹理配方
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Application No.: US14261739Application Date: 2014-04-25
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Publication No.: US09099582B2Publication Date: 2015-08-04
- Inventor: Zhi-Wen Sun , Nikhil Kalyankar , Nitin Kumar , Minh Anh Nguyen , Sagar Vijay
- Applicant: Intermolecular, Inc.
- Applicant Address: US CA San Jose
- Assignee: Intermolecular, Inc.
- Current Assignee: Intermolecular, Inc.
- Current Assignee Address: US CA San Jose
- Main IPC: C09K13/02
- IPC: C09K13/02 ; H01L31/0236 ; C23F1/16

Abstract:
The present disclosure includes a texture formulation that includes an aliphatic diol, an alkaline compound and water which provides a consistent textured region across a silicon surface suitable for solar cell applications. The current invention describes silicon texturing formulations that include at least one high boiling point additive. The high boiling point additive may be a derivative compound of propylene glycol or a derivative compound of ethylene glycol. Processes for texturing a crystalline silicon substrate using these formulations are also described. Additionally, a combinatorial method of optimizing the textured surface of a crystalline silicon substrate is described.
Public/Granted literature
- US20140231704A1 Silicon Texturing Formulations Public/Granted day:2014-08-21
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