Invention Grant
- Patent Title: Deposition mask and mask assembly having the same
- Patent Title (中): 具有相同的沉积掩模和掩模组件
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Application No.: US14295983Application Date: 2014-06-04
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Publication No.: US09105849B2Publication Date: 2015-08-11
- Inventor: Chong-Hyun Park , Tae-Hyung Kim , Il-Hyun Lee
- Applicant: LG DISPLAY CO., LTD.
- Applicant Address: KR Seoul
- Assignee: LG DISPLAY CO., LTD.
- Current Assignee: LG DISPLAY CO., LTD.
- Current Assignee Address: KR Seoul
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: KR10-2010-0007778 20100128
- Main IPC: B05C11/00
- IPC: B05C11/00 ; H01L51/00 ; B05C21/00 ; C23C14/04

Abstract:
A deposition mask assembly having a plurality of deposition masks consecutively arranged in parallel is discussed. The deposition mask has a frame coupled with the plurality of deposition masks, wherein cross section of one end of each deposition mask having first and second sectors which are asymmetric and meet each other at a first contact point, wherein the first sector has a first radius and a first center angle, and connected to an upper surface of the deposition mask, the second sector has a second radius different from the first radius and a second center angle different from the first center angle, and connected to a lower surface of the deposition mask, and the contact point is asymmetric, pointed and protruded horn-shaped or arrow-shaped.
Public/Granted literature
- US20140283742A1 DEPOSITION MASK AND MASK ASSEMBLY HAVING THE SAME Public/Granted day:2014-09-25
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