发明授权
US09116346B2 Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method 有权
照明装置,照明方法,曝光装置和装置制造方法

  • 专利标题: Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
  • 专利标题(中): 照明装置,照明方法,曝光装置和装置制造方法
  • 申请号: US12256055
    申请日: 2008-10-22
  • 公开(公告)号: US09116346B2
    公开(公告)日: 2015-08-25
  • 发明人: Osamu Tanitsu
  • 申请人: Osamu Tanitsu
  • 申请人地址: JP Tokyo
  • 专利权人: NIKON CORPORATION
  • 当前专利权人: NIKON CORPORATION
  • 当前专利权人地址: JP Tokyo
  • 代理机构: Oliff PLC
  • 优先权: JP2007-287987 20071106
  • 主分类号: G03B27/54
  • IPC分类号: G03B27/54 G03B27/72 G02B26/08 G02B27/09 G03F7/20
Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
摘要:
To optionally forming a multilevel light intensity distribution on an illumination pupil plane, the illumination apparatus implements Köhler illumination on an illumination target surface, using as a light source the light intensity distribution formed on the illumination pupil plane on the basis of light from a light source. The illumination apparatus has a spatial light modulator, a condensing optical system, and a control unit. The spatial light modulator has a plurality of reflecting surfaces which are two-dimensionally arranged and postures of which can be controlled independently of each other. The condensing optical system condenses light from the reflecting surfaces to form a predetermined light intensity distribution on the illumination pupil plane. The control unit controls the number of reflecting surfaces contributing to arriving light, for each of points on the illumination pupil plane forming the light intensity distribution, according to a light intensity distribution to be formed on the illumination pupil plane.
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