According to one embodiment, a development processing apparatus including a film reduction amount calculation unit configured to calculate a film reduction amount of a to-be-exposed portion of the photosensitive film, a dimension prediction unit configured to calculate predicted pattern dimension when the developing process is performed in a standard development condition, a dimension correction amount calculation unit configured to calculate a pattern dimension correction amount, a corrected development condition derivation unit configured to derive a corrected development condition based on the calculated pattern dimension correction amount, and a developing mechanism configured to develop the photosensitive film in the derived corrected development condition.