发明授权
- 专利标题: Illumination system and lithographic apparatus
- 专利标题(中): 照明系统和光刻设备
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申请号: US13051384申请日: 2011-03-18
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公开(公告)号: US09116439B2公开(公告)日: 2015-08-25
- 发明人: Heine Melle Mulder , Steven George Hansen , Johannes Catharinus Hubertus Mulkens , Markus Deguenther
- 申请人: Heine Melle Mulder , Steven George Hansen , Johannes Catharinus Hubertus Mulkens , Markus Deguenther
- 申请人地址: NL Veldhoven DE Oberkochen
- 专利权人: ASML NETHERLANDS B.V.,CARL ZEISS SMT GmbH
- 当前专利权人: ASML NETHERLANDS B.V.,CARL ZEISS SMT GmbH
- 当前专利权人地址: NL Veldhoven DE Oberkochen
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 主分类号: G03F7/20
- IPC分类号: G03F7/20
摘要:
An illumination system is disclosed having a polarization member that includes first and second polarization modifiers movable into at least partial intersection with a radiation beam such that the respective polarization modifier applies a modified polarization to at least part of the beam. The illumination system further includes an array of individually controllable reflective elements positioned to receive the radiation beam after it has passed the polarization member, and a controller configured to control movement of the first and second polarization modifiers such that the first and second polarization modifiers intersect with different portions of the radiation beam.
公开/授权文献
- US20110228247A1 ILLUMINATION SYSTEM AND LITHOGRAPHIC APPARATUS 公开/授权日:2011-09-22
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