- 专利标题： Lithographic apparatus and device manufacturing method
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申请号： US13188096申请日： 2011-07-21
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公开(公告)号： US09116443B2公开(公告)日： 2015-08-25
- 发明人: Theodorus Marinus Modderman
- 申请人： Theodorus Marinus Modderman
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03B27/42 ; G03B27/58 ; G03F7/20
摘要：
In a single or multiple stage lithography apparatus, a table provides a confining surface to a liquid supply system during, for example, substrate table exchange and/or substrate loading and unloading. In an embodiment, the table has a sensor to make a measurement of the projection beam during, for example, substrate table exchange and/or substrate loading and unloading.
公开/授权文献
- US20110279806A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 公开/授权日：2011-11-17
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