Invention Grant
US09123508B2 Apparatus and method for sputtering hard coatings 有权
用于溅射硬涂层的装置和方法

Apparatus and method for sputtering hard coatings
Abstract:
A plasma generator includes a chamber for confining a feed gas. An anode is positioned inside the chamber. A cathode assembly is positioned adjacent to the anode inside the chamber. A pulsed power supply comprising at least two solid state switches and having an output that is electrically connected between the anode and the cathode assembly generates voltage micropulses. A pulse width and a duty cycle of the voltage micropulses are generated using a voltage waveform comprising voltage oscillation having amplitudes and frequencies that generate a strongly ionized plasma.
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