Invention Grant
- Patent Title: Apparatus and method for sputtering hard coatings
- Patent Title (中): 用于溅射硬涂层的装置和方法
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Application No.: US13010762Application Date: 2011-01-20
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Publication No.: US09123508B2Publication Date: 2015-09-01
- Inventor: Roman Chistyakov , Bassam Hanna Abraham
- Applicant: Roman Chistyakov , Bassam Hanna Abraham
- Applicant Address: US MA Mansfield
- Assignee: Zond, LLC
- Current Assignee: Zond, LLC
- Current Assignee Address: US MA Mansfield
- Agency: Hoffman & Baron, LLP
- Main IPC: H05H1/24
- IPC: H05H1/24 ; H05H1/46 ; H01J7/24 ; H01J37/32 ; H01J37/34

Abstract:
A plasma generator includes a chamber for confining a feed gas. An anode is positioned inside the chamber. A cathode assembly is positioned adjacent to the anode inside the chamber. A pulsed power supply comprising at least two solid state switches and having an output that is electrically connected between the anode and the cathode assembly generates voltage micropulses. A pulse width and a duty cycle of the voltage micropulses are generated using a voltage waveform comprising voltage oscillation having amplitudes and frequencies that generate a strongly ionized plasma.
Public/Granted literature
- US20110133651A1 Methods And Apparatus For Generating Strongly-Ionized Plasmas With Ionizational Instabilities Public/Granted day:2011-06-09
Information query
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