发明授权
US09123550B2 Semiconductor devices using air spaces to separate conductive structures and methods of manufacturing the same 有权
使用空气空间来分离导电结构的半导体器件及其制造方法

Semiconductor devices using air spaces to separate conductive structures and methods of manufacturing the same
摘要:
A semiconductor device includes a substrate, a conductive pattern (e.g., a contact plug) on an active region of the substrate and having respective first and second sidewalls on opposite first and second sides of the conductive pattern, and first and second conductive lines (e.g., bit lines) on the substrate on respective ones of the first and second sides of conductive pattern and separated from the respective first and second sidewalls by asymmetric first and second air spaces.
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