Invention Grant
- Patent Title: Inspection apparatus, lithographic apparatus, lithographic processing cell and inspection method
- Patent Title (中): 检验仪器，光刻设备，平版印刷加工电池及检验方法
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Application No.: US14242225Application Date: 2014-04-01
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Publication No.: US09128065B2Publication Date: 2015-09-08
- Inventor: Hugo Augustinus Joseph Cramer , Antoine Gaston Marie Kiers , Henricus Petrus Maria Pellemans
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C
- Main IPC: G01B11/00
- IPC: G01B11/00 ; G01N21/86 ; G03B27/32 ; G03B27/42 ; G03B27/54 ; G03B27/74 ; G01N21/956 ; G03F9/00 ; G01J3/18 ; G01J3/28 ; G01J3/44 ; G01N21/47 ; G01N21/95 ; G03F7/20
Abstract:
For angular resolved spectrometry a radiation beam is used having an illumination profile having four quadrants is used. The first and third quadrants are illuminated whereas the second and fourth quadrants aren't illuminated. The resulting pupil plane is thus also divided into four quadrants with only the zeroth order diffraction pattern appearing in the first and third quadrants and only the first order diffraction pattern appearing in the second and third quadrants.
Public/Granted literature
- US20140211185A1 Inspection Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Inspection Method Public/Granted day:2014-07-31
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