发明授权
- 专利标题： Method for modifying a polarization distribution in microlithographic projection exposure apparatus, and microlithographic projection exposure apparatus
- 专利标题（中）： 用于修改微光刻投影曝光装置中的偏光分布的方法，以及微光刻投影曝光装置
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申请号： US13010145申请日： 2011-01-20
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公开(公告)号： US09128389B2公开(公告)日： 2015-09-08
- 发明人: Damian Fiolka
- 申请人： Damian Fiolka
- 申请人地址： DE Oberkochen
- 专利权人： Carl Zeiss SMT GmbH
- 当前专利权人： Carl Zeiss SMT GmbH
- 当前专利权人地址： DE Oberkochen
- 代理机构： Fish & Richardson P.C.
- 优先权： DE102008040611 20080722
- 主分类号： G03B27/42
- IPC分类号： G03B27/42 ; G03F7/20
摘要：
The disclosure relates to a method for modifying a polarization distribution in a microlithographic projection exposure apparatus, and to a microlithographic projection exposure apparatus. The projection exposure apparatus has an illumination device and a projection objective. The illumination device has an optical axis and a correction arrangement having a lambda/4 plate arranged rotatably about the optical axis and/or a lambda/2 plate arranged rotatably about the optical axis. The method includes determining a polarization distribution in a predetermined plane of the projection exposure apparatus, and rotating the lambda/4 plate and/or the lambda/2 plate about the optical axis so that a local variation of the polarization distribution is reduced after rotation in comparison with the state before the rotating.
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