Invention Grant
- Patent Title: High speed x-ray inspection microscope
- Patent Title (中): 高速x射线检查显微镜
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Application No.: US13987808Application Date: 2013-09-04
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Publication No.: US09129715B2Publication Date: 2015-09-08
- Inventor: David Lewis Adler , Benjamin Thomas Adler , Freddie Erich Babian
- Applicant: David Lewis Adler , Benjamin Thomas Adler , Freddie Erich Babian
- Applicant Address: US CA San Jose
- Assignee: SVXR, Inc.
- Current Assignee: SVXR, Inc.
- Current Assignee Address: US CA San Jose
- Agent Franklin Schellenberg
- Main IPC: G21K7/00
- IPC: G21K7/00

Abstract:
A high resolution x-ray microscope with a high flux x-ray source that allows high speed metrology or inspection of objects such as integrated circuits (ICs), printed circuit boards (PCBs), and other IC packaging technologies. The object to be investigated is illuminated by collimated, high-flux x-rays from an extended source having a designated x-ray spectrum. The system also comprises a stage to control the position and orientation of the object; a scintillator that absorbs x-rays and emits visible photons positioned in very close proximity to (or in contact with) the object; an optical imaging system that forms a highly magnified, high-resolution image of the photons emitted by the scintillator; and a detector such as a CCD array to convert the image to electronic signals.
Public/Granted literature
- US20140064445A1 High speed x-ray inspection microscope Public/Granted day:2014-03-06
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