Invention Grant
US09129777B2 Electron beam plasma source with arrayed plasma sources for uniform plasma generation
有权
具有阵列等离子体源的电子束等离子体源，用于均匀等离子体产生
- Patent Title: Electron beam plasma source with arrayed plasma sources for uniform plasma generation
- Patent Title (中): 具有阵列等离子体源的电子束等离子体源，用于均匀等离子体产生
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Application No.: US13595201Application Date: 2012-08-27
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Publication No.: US09129777B2Publication Date: 2015-09-08
- Inventor: Leonid Dorf , Shahid Rauf , Kenneth S. Collins , Nipun Misra , James D. Carducci , Gary Leray , Kartik Ramaswamy
- Applicant: Leonid Dorf , Shahid Rauf , Kenneth S. Collins , Nipun Misra , James D. Carducci , Gary Leray , Kartik Ramaswamy
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agent Robert M. Wallace
- Main IPC: C23F1/08
- IPC: C23F1/08 ; H01J37/32
Abstract:
A plasma reactor that generates plasma in workpiece processing chamber by a electron beam, has an electron beam source chamber and an array of plasma sources facing the electron beam source chamber for affecting plasma electron density in different portions of the processing chamber. In another embodiment, an array of separately controlled electron beam source chambers is provided.
Public/Granted literature
- US20130098551A1 ELECTRON BEAM PLASMA SOURCE WITH ARRAYED PLASMA SOURCES FOR UNIFORM PLASMA GENERATION Public/Granted day:2013-04-25
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