Invention Grant
US09133550B2 Etching composition, method of forming a metal pattern using the etching composition, and method of manufacturing a display substrate
有权
蚀刻组合物，使用蚀刻组合物形成金属图案的方法，以及制造显示基板的方法
- Patent Title: Etching composition, method of forming a metal pattern using the etching composition, and method of manufacturing a display substrate
- Patent Title (中): 蚀刻组合物，使用蚀刻组合物形成金属图案的方法，以及制造显示基板的方法
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Application No.: US13433013Application Date: 2012-03-28
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Publication No.: US09133550B2Publication Date: 2015-09-15
- Inventor: In-Bae Kim , Jong-Hyun Choung , Ji-Young Park , Seon-Il Kim , Jae-Woo Jeong , Sang Gab Kim , Sang-Woo Kim , Ki-Beom Lee , Dae-Woo Lee , Sam-Young Cho
- Applicant: In-Bae Kim , Jong-Hyun Choung , Ji-Young Park , Seon-Il Kim , Jae-Woo Jeong , Sang Gab Kim , Sang-Woo Kim , Ki-Beom Lee , Dae-Woo Lee , Sam-Young Cho
- Applicant Address: KR Yongin
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin
- Agency: H.C. Park & Associates, PLC
- Priority: KR10-2011-0078297 20110805
- Main IPC: C09K13/00
- IPC: C09K13/00 ; C23F1/18 ; C23F1/26 ; H01L21/3213 ; C09K13/08 ; H01L27/12
Abstract:
An etching composition, a method of forming a metal pattern using the etching composition, and a method of manufacturing a display substrate are disclosed. The etching composition includes about 0.1% by weight to about 25% by weight of ammonium persulfate, about 0.1% by weight to about 25% by weight of an organic acid, about 0.01% by weight to about 5% by weight of a chelating agent, about 0.01% by weight to about 5% by weight of a fluoride compound, about 0.01% by weight to about 5% by weight of a chloride compound, about 0.01% by weight to about 2% by weight of an azole-based compound and a remainder of water. Thus, a copper layer may be stably etched to improve a reliability of manufacturing the metal pattern and the display substrate.
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