Invention Grant
- Patent Title: Through silicon via repair circuit
- Patent Title (中): 通过硅经修复电路
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Application No.: US13902988Application Date: 2013-05-28
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Publication No.: US09136250B2Publication Date: 2015-09-15
- Inventor: Pei-Ling Tseng , Keng-Li Su
- Applicant: Industrial Technology Research Institute
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: Jianq Chyun IP Office
- Priority: TW101150631A 20121227
- Main IPC: H03K19/003
- IPC: H03K19/003 ; H01L25/065

Abstract:
A through silicon via (TSV) repair circuit is provided. The TSV repair circuit includes at least two transmission control switches and at least two transmission path modules. Two transmission control switches transmit an input signal of a first chip or a second chip to one of two terminals in each of the transmission path modules according to a switch signal. Each transmission path module includes at least two data path circuits and corresponding TSVs. Each data path circuit includes an input driving circuit, a short-circuit detection circuit and a leakage current cancellation circuit. The short-circuit detection circuit detects whether to detect whether short-circuit on the TSV and a silicon substrate is present and generate a short-circuit detection output signal. The leakage current cancellation circuit to avoid a leakage current generated by a first level voltage to flow into the silicon substrate according to the short-circuit detection output signal.
Public/Granted literature
- US20140184322A1 THROUGH SILICON VIA REPAIR CIRCUIT Public/Granted day:2014-07-03
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