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US09140996B2 Lithographic apparatus and device manufacturing method 有权
平版印刷设备和器件制造方法

Lithographic apparatus and device manufacturing method
Abstract:
An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.
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