A double-surface manufacturing method and an exposure apparatus in the manufacturing process of semiconductors and liquid crystal displays (LCD) are provided. In the exposure process, two masks in the exposure apparatus are subjected to alignment treatment; the substrate is conveyed to a position between the two masks in the exposure apparatus; and patterns of the two surfaces of the substrate are processed. The exposure apparatus comprises two masks, wherein a substrate to be processed is disposed between the two masks; and mask alignment marks are respectively disposed on the two masks. The embodiments of the present invention improve the accuracy of the patterns of the two surfaces of the substrate and the product quality in the double surfaces manufacturing of the substrate.