Invention Grant
US09142558B2 Semiconductor device having supporter and method of forming the same 有权
具有支撑体的半导体装置及其形成方法

Semiconductor device having supporter and method of forming the same
Abstract:
A semiconductor device includes a plurality of lower electrodes having a vertical length greater than a horizontal width on a substrate, a supporter disposed between the lower electrodes, an upper electrode disposed on the lower electrodes, and a capacitor dielectric layer disposed between the lower electrodes and the upper electrode. The supporter includes a first element, a second element, and oxygen, an oxide of the second element has a higher band gap energy than an oxide of the first element, and the content of the second element in the supporter is from about 10 at % to 90 at %.
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