Invention Grant
US09142589B2 Solid-state imaging device, method of manufacturing the same, and imaging apparatus 有权
固态成像装置及其制造方法和成像装置

Solid-state imaging device, method of manufacturing the same, and imaging apparatus
Abstract:
A solid-state imaging device includes a photoelectric conversion section which is disposed on a semiconductor substrate and which photoelectrically converts incident light into signal charges, a pixel transistor section which is disposed on the semiconductor substrate and which converts signal charges read out from the photoelectric conversion section into a voltage, and an element isolation region which is disposed on the semiconductor substrate and which isolates the photoelectric conversion section from an active region in which the pixel transistor section is disposed. The pixel transistor section includes a plurality of transistors. Among the plurality of transistors, in at least one transistor in which the gate width direction of its gate electrode is oriented toward the photoelectric conversion section, at least a photoelectric conversion section side portion of the gate electrode is disposed within and on the active region with a gate insulating film therebetween.
Information query
Patent Agency Ranking
0/0