Invention Grant
- Patent Title: Semiconductor device including supporters on a lower electrode thereof and method of fabricating the same
- Patent Title (中): 包括在其下电极上的支撑体的半导体器件及其制造方法
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Application No.: US14074959Application Date: 2013-11-08
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Publication No.: US09142610B2Publication Date: 2015-09-22
- Inventor: Hong-Gun Kim , Kwang-Tae Hwang , Young-Min Ko
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2012-0134532 20121126
- Main IPC: H01L27/00
- IPC: H01L27/00 ; H01L49/02 ; H01L27/108

Abstract:
A semiconductor device and a method of fabricating the same, the device including a substrate having a transistor formed thereon; a plurality of lower electrodes formed on the substrate; a first supporter and a second supporter on the plurality of lower electrodes; a dielectric film formed on the lower electrode, the first supporter, and the second supporter; and an upper electrode formed on the dielectric film, wherein the first and second supporters are positioned between the lower electrodes, and the first and second supporters include a first material and a second material.
Public/Granted literature
- US20140145303A1 SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME Public/Granted day:2014-05-29
Information query
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