Invention Grant
- Patent Title: Integrated electronic device with edge-termination structure and manufacturing method thereof
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Application No.: US14645185Application Date: 2015-03-11
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Publication No.: US09142646B2Publication Date: 2015-09-22
- Inventor: Ferruccio Frisina , Angelo Magri′ , Mario Giuseppe Saggio
- Applicant: STMICROELECTRONICS S.R.L.
- Applicant Address: IT Agrate Brianza (MB)
- Assignee: STMICROELECTRONICS S.R.L.
- Current Assignee: STMICROELECTRONICS S.R.L.
- Current Assignee Address: IT Agrate Brianza (MB)
- Agency: Allen, Dyer, Dopperlt, Milbrath & Gilchrist, P.A.
- Priority: ITTO2010A0724 20100830
- Main IPC: H01L21/20
- IPC: H01L21/20 ; H01L29/66 ; H01L29/16 ; H01L29/165 ; H01L29/06 ; H01L21/02

Abstract:
An embodiment of an integrated electronic device formed in a semiconductor body delimited by a lateral surface, which includes: a substrate made of a first semiconductor material; a first epitaxial region made of a second semiconductor material, which overlies the substrate and defines a first surface; a second epitaxial region made of a third semiconductor material, which overlies the first surface and is in contact with the first epitaxial region, the third semiconductor material having a bandgap narrower than the bandgap of the second semiconductor material; an active area, extending within the second epitaxial region and housing at least one elementary electronic component; and an edge structure, arranged between the active area and the lateral surface, and including a dielectric region arranged laterally with respect to the second epitaxial region, which overlies the first surface and is in contact with the first epitaxial region.
Public/Granted literature
- US20150187912A1 INTEGRATED ELECTRONIC DEVICE WITH EDGE-TERMINATION STRUCTURE AND MANUFACTURING METHOD THEREOF Public/Granted day:2015-07-02
Information query
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