Invention Grant
- Patent Title: Cavity structures for MEMS devices
- Patent Title (中): MEMS器件的腔结构
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Application No.: US14281251Application Date: 2014-05-19
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Publication No.: US09145292B2Publication Date: 2015-09-29
- Inventor: Bernhard Winkler , Andreas Zankl , Klemens Pruegl , Stefan Kolb
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Schiff Hardin LLP
- Main IPC: H01L21/71
- IPC: H01L21/71 ; H01L21/205 ; H01L27/04 ; H01L27/20 ; B81B7/02 ; B81B7/00 ; B81C1/00 ; H01L27/06

Abstract:
Embodiments relate to MEMS devices, particularly MEMS devices integrated with related electrical devices on a single wafer. Embodiments utilize a modular process flow concept as part of a MEMS-first approach, enabling use of a novel cavity sealing process. The impact and potential detrimental effects on the electrical devices by the MEMS processing are thereby reduced or eliminated. At the same time, a highly flexible solution is provided that enables implementation of a variety of measurement principles, including capacitive and piezoresistive. A variety of sensor applications can therefore be addressed with improved performance and quality while remaining cost-effective.
Public/Granted literature
- US20140252422A1 CAVITY STRUCTURES FOR MEMS DEVICES Public/Granted day:2014-09-11
Information query
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