Invention Grant
- Patent Title: Photoresist employing photodimerization chemistry and method for manufacturing organic light emitting diode display using the same
- Patent Title (中): 光致抗蚀剂采用光二聚化学化学和制造有机发光二极管显示器的方法
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Application No.: US13903657Application Date: 2013-05-28
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Publication No.: US09147842B2Publication Date: 2015-09-29
- Inventor: Jinkyun Lee , Youngmi Kim , Jonggeun Yoon , Joonyoung Heo , Euidoo Do , Yeonkyeong Lee , Soohyun Kim
- Applicant: LG Display Co., Ltd. , INHA Industry Partnership Institute
- Applicant Address: KR Seoul KR Seoul
- Assignee: LG Display Co., Ltd.,INHA Industry Partnership Institute
- Current Assignee: LG Display Co., Ltd.,INHA Industry Partnership Institute
- Current Assignee Address: KR Seoul KR Seoul
- Agency: Fenwick & West LLP
- Priority: KR10-2012-0138223 20121130
- Main IPC: C08F20/10
- IPC: C08F20/10 ; C08F20/24 ; H01L51/00 ; G03F7/004 ; G03F7/038 ; H01L27/32
Abstract:
A highly fluorinated photoresist employing a photodimerization chemistry and a method for manufacturing an organic light emitting diode display using the same. The photoresist includes a copolymer that is made from two different monomers. When the copolymer is used as a photoresist, the photoresist has the characteristic that it becomes insoluble when exposed to an ultraviolet light having a wavelength of 365 nm.
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