发明授权
US09152062B2 Pattern forming device, pattern forming method, and device manufacturing method
有权
图案形成装置，图案形成方法和装置制造方法
- 专利标题： Pattern forming device, pattern forming method, and device manufacturing method
- 专利标题（中）： 图案形成装置，图案形成方法和装置制造方法
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申请号： US13526428申请日： 2012-06-18
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公开(公告)号： US09152062B2公开(公告)日： 2015-10-06
- 发明人: Tohru Kiuchi , Hideo Mizutani
- 申请人： Tohru Kiuchi , Hideo Mizutani
- 申请人地址： JP Tokyo
- 专利权人： NIKON CORPORATION
- 当前专利权人： NIKON CORPORATION
- 当前专利权人地址： JP Tokyo
- 代理机构： Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- 主分类号： B29C35/02
- IPC分类号： B29C35/02 ; G03F7/20 ; G03F9/00
摘要：
Presented are methods for forming a predetermined pattern in a predetermined area of an elongated sheet material. The methods include applying a two-dimensional tension to a portion including the predetermined area of the sheet material, and allowing a flat reference surface to adsorb a rear surface portion corresponding to the predetermined area of the sheet material applied with the two-dimensional tension. The methods then illuminate an energy beam corresponding to the pattern to the predetermined area of the sheet material adsorbed to the reference surface.
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