发明授权
- 专利标题： Polishing pad with light-stable light-transmitting region
- 专利标题（中）： 抛光垫具有光稳定的透光区域
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申请号： US13444620申请日： 2012-04-11
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公开(公告)号： US09156125B2公开(公告)日： 2015-10-13
- 发明人: Abaneshwar Prasad
- 申请人： Abaneshwar Prasad
- 申请人地址： US IL Aurora
- 专利权人： Cabot Microelectronics Corporation
- 当前专利权人： Cabot Microelectronics Corporation
- 当前专利权人地址： US IL Aurora
- 代理商 Thomas Omholt; Arlene Hornilla
- 主分类号： B24B37/24
- IPC分类号： B24B37/24 ; B24B37/20
摘要：
The invention provides a polishing pad that contains at least one light-transmitting region and optionally a polishing pad body. The light-transmitting region is composed of a material comprising (a) a polymeric resin and (b) at least one light-absorbing compound, and the light-transmitting region has a total light transmittance of about 25% or more at one or more wavelengths in a range of 250 nm to 395 nm.
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