Invention Grant
- Patent Title: SRAM bitcell implemented in double gate technology
- Patent Title (中): 采用双栅极技术实现SRAM位单元
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Application No.: US13539577Application Date: 2012-07-02
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Publication No.: US09159402B2Publication Date: 2015-10-13
- Inventor: Vivek Asthana , Malathi Kar , Philippe Galy , Jean Jimenez
- Applicant: Vivek Asthana , Malathi Kar , Philippe Galy , Jean Jimenez
- Applicant Address: NL Amsterdam FR Montrouge
- Assignee: STMicroelectronics International N.V.,STMicroelectronics SA
- Current Assignee: STMicroelectronics International N.V.,STMicroelectronics SA
- Current Assignee Address: NL Amsterdam FR Montrouge
- Agency: Gardere Wynne Sewell LLP
- Main IPC: G11C11/00
- IPC: G11C11/00 ; G11C11/412 ; G11C11/419

Abstract:
An SRAM bitcell includes first and second CMOS inverters connected as a latch defining a true node and a complement node. The bitcell further includes true and complement bitline nodes. A first direct connection is provided between the true bitline node and a back gate of at least a p-channel transistor, and perhaps also an n-channel transistor, in the second CMOS inverter. A second direct connection is provided between the complement bitline node and a back gate of at least a p-channel transistor, and perhaps also an n-channel transistor, in the first CMOS inverter. A first pass transistor is coupled between the true bitline node and the true node, and a second pass transistor is coupled between the complement bitline node and the complement node. Direct connections are also provided between a wordline and the back gates of each of the first and second pass transistors.
Public/Granted literature
- US20140003135A1 SRAM BITCELL IMPLEMENTED IN DOUBLE GATE TECHNOLOGY Public/Granted day:2014-01-02
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