Invention Grant
US09159402B2 SRAM bitcell implemented in double gate technology 有权
采用双栅极技术实现SRAM位单元

SRAM bitcell implemented in double gate technology
Abstract:
An SRAM bitcell includes first and second CMOS inverters connected as a latch defining a true node and a complement node. The bitcell further includes true and complement bitline nodes. A first direct connection is provided between the true bitline node and a back gate of at least a p-channel transistor, and perhaps also an n-channel transistor, in the second CMOS inverter. A second direct connection is provided between the complement bitline node and a back gate of at least a p-channel transistor, and perhaps also an n-channel transistor, in the first CMOS inverter. A first pass transistor is coupled between the true bitline node and the true node, and a second pass transistor is coupled between the complement bitline node and the complement node. Direct connections are also provided between a wordline and the back gates of each of the first and second pass transistors.
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