Invention Grant
- Patent Title: Nanotube structure based metal damascene process
- Patent Title (中): 纳米管结构基金属镶嵌工艺
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Application No.: US14168025Application Date: 2014-01-30
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Publication No.: US09159669B2Publication Date: 2015-10-13
- Inventor: Ravi Joshi , Juergen Steinbrenner
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: INFINEON TECHNOLOGIES AG
- Current Assignee: INFINEON TECHNOLOGIES AG
- Current Assignee Address: DE Neubiberg
- Main IPC: H01L23/528
- IPC: H01L23/528 ; H01L21/768 ; H01L21/02 ; H01L23/532

Abstract:
In various embodiments a method for manufacturing a metallization layer on a substrate is provided, wherein the method may include forming a plurality of groups of nanotubes over a substrate, wherein the groups of nanotubes may be arranged such that a portion of the substrate is exposed and forming metal over the exposed portion of the substrate between the plurality of groups of nanotubes.
Public/Granted literature
- US20150214144A1 NANOTUBE STRUCTURE BASED METAL DAMASCENE PROCESS Public/Granted day:2015-07-30
Information query
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