Invention Grant
US09165238B2 Methods for manufacturing RFID tags and structures formed therefrom
有权
用于制造由其形成的RFID标签和结构的方法
- Patent Title: Methods for manufacturing RFID tags and structures formed therefrom
- Patent Title (中): 用于制造由其形成的RFID标签和结构的方法
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Application No.: US12689703Application Date: 2010-01-19
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Publication No.: US09165238B2Publication Date: 2015-10-20
- Inventor: James Montague Cleeves , J. Devin MacKenzie , Arvind Kamath
- Applicant: James Montague Cleeves , J. Devin MacKenzie , Arvind Kamath
- Applicant Address: NO Oslo
- Assignee: Thin Film Electronics ASA
- Current Assignee: Thin Film Electronics ASA
- Current Assignee Address: NO Oslo
- Agency: Central California IP Group, P.C.
- Agent Andrew D. Fortney
- Main IPC: H01L21/3205
- IPC: H01L21/3205 ; G06K19/077 ; H01F17/00

Abstract:
Radio frequency identification (RFID) tags and processes for manufacturing the same. The RFID device generally includes (1) a metal antenna and/or inductor; (2) a dielectric layer thereon, to support and insulate integrated circuitry from the metal antenna and/or inductor; (3) a plurality of diodes and a plurality of transistors on the dielectric layer, the diodes having at least one layer in common with the transistors; and (4) a plurality of capacitors in electrical communication with the metal antenna and/or inductor and at least some of the diodes, the plurality of capacitors having at least one layer in common with the plurality of diodes and/or with contacts to the diodes and transistors. The method preferably integrates liquid silicon-containing ink deposition into a cost effective, integrated manufacturing process for the manufacture of RFID circuits. Furthermore, the present RFID tags generally provide higher performance (e.g., improved electrical characteristics) as compared to tags containing organic electronic devices.
Public/Granted literature
- US20100148859A1 Methods for Manufacturing RFID Tags and Structures Formed Therefrom Public/Granted day:2010-06-17
Information query
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