The invention relates to an arc source with a target (1) having a target front face (2) for the vacuum vaporization of the target material, a target backside with a cooling plate (4), a central target region (Z) as well as a target margin. The arc source further comprises a magnet configuration (8, 9) with an inner magnet system (8) and/or an outer magnet system (9) for the generation of a magnetic field in the proximity of the target front face. At least one of the magnet systems (8) is herein radially poled and effects alone or in connection with the particular other magnet system that the field lines of the magnetic field extend here substantially parallel to the target front face (2).