Invention Grant
US09166166B2 Deposition mask, method of manufacturing display apparatus by using the deposition mask, and display apparatus manufactured by the method
有权
沉积掩模,使用沉积掩模制造显示装置的方法以及通过该方法制造的显示装置
- Patent Title: Deposition mask, method of manufacturing display apparatus by using the deposition mask, and display apparatus manufactured by the method
- Patent Title (中): 沉积掩模,使用沉积掩模制造显示装置的方法以及通过该方法制造的显示装置
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Application No.: US14030502Application Date: 2013-09-18
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Publication No.: US09166166B2Publication Date: 2015-10-20
- Inventor: Nam-Jin Kim , Chul-Hwan Park
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Giheung-Gu, Yongin-si, Gyeonggi-Do
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Giheung-Gu, Yongin-si, Gyeonggi-Do
- Agent Robert E. Bushnell, Esq.
- Priority: KR10-2013-0041835 20130416
- Main IPC: H05B33/10
- IPC: H05B33/10 ; H01L51/00 ; C23C14/04 ; H01L51/52

Abstract:
A deposition mask that prevents the occurrence of defects when forming an encapsulation film or securing a long lifespan of the encapsulation film, a method of manufacturing a display apparatus by using the deposition mask, and a display apparatus manufactured by the method. The deposition mask has a first portion and a second portion, the second portion being thicker that the first portion; at least one opening in the first portion, deposition materials being passed through the opening; and a plurality of through-holes in the first portion adjacent to and surrounding the opening, the through-holes extending from an upper surface to a lower surface of the first portion, light being passed through the opening and the plurality of through-holes to irradiate the deposition materials.
Public/Granted literature
Information query