Invention Grant
US09168777B2 Cliche for off-set printing and product manufactured using the same
有权
Cliche用于偏移印刷和使用其制造的产品
- Patent Title: Cliche for off-set printing and product manufactured using the same
- Patent Title (中): Cliche用于偏移印刷和使用其制造的产品
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Application No.: US13119920Application Date: 2009-09-28
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Publication No.: US09168777B2Publication Date: 2015-10-27
- Inventor: Sang-Ki Chun , In-Seok Hwang , Dong-Wook Lee
- Applicant: Sang-Ki Chun , In-Seok Hwang , Dong-Wook Lee
- Applicant Address: KR Seoul
- Assignee: LG CHEM, LTD.
- Current Assignee: LG CHEM, LTD.
- Current Assignee Address: KR Seoul
- Agency: Dentons US LLP
- Priority: KR10-2008-0094460 20080926; KR10-2009-0091815 20090928
- International Application: PCT/KR2009/005536 WO 20090928
- International Announcement: WO2010/036075 WO 20100401
- Main IPC: B41N1/06
- IPC: B41N1/06 ; B41N1/12 ; H05K3/12 ; H05K9/00
Abstract:
The present invention relates to a cliche for offset printing for forming a mesh pattern, and more specifically, to a cliche for offset printing comprising a mash pattern with a plurality of intersection units, wherein the plurality of intersection units are formed in a curved shape with a radius of curvature 0.6 to 4 times that of a mesh line width.When the cliche for offset printing of the present invention is used, line width reductions generated around the intersection units during mesh pattern printing may be reduced. As a result, when a final product is manufactured by using the cliche for printing of the present invention, the surface resistance properties of the product may be improved.
Public/Granted literature
- US20110174176A1 CLICHE FOR OFF-SET PRINTING AND PRODUCT MANUFACTURED USING THE SAME Public/Granted day:2011-07-21
Information query
