Invention Grant
US09170350B2 Lens with broadband anti-reflective structures formed by nano island mask and method of making the same
有权
具有纳米岛掩模形成的宽带抗反射结构的透镜及其制造方法
- Patent Title: Lens with broadband anti-reflective structures formed by nano island mask and method of making the same
- Patent Title (中): 具有纳米岛掩模形成的宽带抗反射结构的透镜及其制造方法
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Application No.: US13685550Application Date: 2012-11-26
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Publication No.: US09170350B2Publication Date: 2015-10-27
- Inventor: Ki-Hun Jeong , Hyukjin Jung
- Applicant: KAIST (Korea Advanced Institute of Science and Technology)
- Applicant Address: KR Daejeon
- Assignee: KAIST (Korea Advanced Institute of Science and Technology)
- Current Assignee: KAIST (Korea Advanced Institute of Science and Technology)
- Current Assignee Address: KR Daejeon
- Agency: IP & T Group LLP
- Priority: KR10-2011-0123400 20111124
- Main IPC: G02B3/00
- IPC: G02B3/00 ; G02B27/10 ; G02B3/02 ; G02B1/118 ; B82Y20/00
Abstract:
The present invention provides a lens having broadband anti-reflective nanostructures formed using nano-island masks and a method for making the same, in which nanostructures having a size and period equal to or smaller than the light wavelength are formed on the surface of a lens to obtain a lens having decreased reflectance, increased transmittance and high efficiency. The lens having broadband anti-reflective nanostructures formed using nano-island masks comprises: a lens having a planar shape or a predetermined curvature; and anti-reflective nanostructures formed on one surface of the lens using nano-island masks, in which the horizontal and vertical cross-sections of the anti-reflective nanostructures have a size equal to or smaller than the light wavelength.
Public/Granted literature
- US20130155522A1 LENS WITH BROADBAND ANTI-REFLECTIVE STRUCTURES FORMED BY NANO ISLAND MASK AND METHOD OF MAKING THE SAME Public/Granted day:2013-06-20
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