发明授权
- 专利标题： Pyrroloquinoline quinone disodium salt crystal and method for producing the same
- 专利标题（中）： 吡咯喹啉醌二钠盐晶体及其制备方法
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申请号： US14125788申请日： 2012-06-15
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公开(公告)号： US09174983B2公开(公告)日： 2015-11-03
- 发明人: Kazuto Ikemoto , Hitoshi Sakamoto
- 申请人： Kazuto Ikemoto , Hitoshi Sakamoto
- 申请人地址： JP Tokyo
- 专利权人： MITSUBISHI GAS CHEMICAL COMPANY, INC.
- 当前专利权人： MITSUBISHI GAS CHEMICAL COMPANY, INC.
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP2011-134279 20110616
- 国际申请： PCT/JP2012/065303 WO 20120615
- 国际公布： WO2012/173217 WO 20121220
- 主分类号： C07D471/04
- IPC分类号： C07D471/04 ; C12P7/66
摘要：
An object of the present invention is to provide a novel pyrroloquinoline quinone disodium crystal having excellent dispersibility in solvents and excellent permeability through skin, and a method for producing the pyrroloquinoline quinone disodium crystal with high efficiency. According to the present invention, provided are a novel pyrroloquinoline quinone disodium crystal which is produced by drying a crystal produced under specified conditions through a drying means such as lyophilization, ambient drying and vacuum drying, and a method for producing the pyrroloquinoline quinone disodium crystal.
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