Invention Grant
- Patent Title: Substituted silacyclopropane precursors and their use for the deposition of silicon-containing films
- Patent Title (中): 取代硅环丙烷前体及其用于沉积含硅膜的用途
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Application No.: US14560517Application Date: 2014-12-04
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Publication No.: US09177783B2Publication Date: 2015-11-03
- Inventor: Mark Saly , David Thompson
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: C07F7/00
- IPC: C07F7/00 ; H01L21/02 ; C07F7/10
Abstract:
Provided are silacyclopropane-based compounds and methods of making the same. Also provided are methods of using said compounds in film deposition processes to deposit films comprising silicon. Certain methods comprise exposing a substrate surface to a silacyclopropane-based precursor and a co-reagent in various combinations.
Public/Granted literature
- US20150162191A1 Substituted Silacyclopropane Precursors And Their Use For The Deposition Of Silicon-Containing Films Public/Granted day:2015-06-11
Information query
