发明授权
US09178022B2 Precursor composition and method for forming amorphous conductive oxide film
有权
前体组合物和形成非晶导电氧化物膜的方法
- 专利标题： Precursor composition and method for forming amorphous conductive oxide film
- 专利标题（中）： 前体组合物和形成非晶导电氧化物膜的方法
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申请号： US13809993申请日： 2011-07-08
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公开(公告)号： US09178022B2公开(公告)日： 2015-11-03
- 发明人: Tatsuya Shimoda , Jinwang Li
- 申请人： Tatsuya Shimoda , Jinwang Li
- 申请人地址： JP Kawaguchi-shi
- 专利权人： JAPAN SCIENCE AND TECHNOLOGY AGENCY
- 当前专利权人： JAPAN SCIENCE AND TECHNOLOGY AGENCY
- 当前专利权人地址： JP Kawaguchi-shi
- 代理机构： Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP2010-159475 20100714
- 国际申请： PCT/JP2011/066165 WO 20110708
- 国际公布： WO2012/008554 WO 20120119
- 主分类号： H01L29/22
- IPC分类号： H01L29/22 ; C01G55/00 ; H01B1/08 ; H01L29/49 ; H01L29/786 ; H01L21/02
摘要：
The present invention provides a precursor composition for forming a conductive oxide film having high conductivity and a stable amorphous structure maintained even after heated at high temperature by a simple liquid phase process. The precursor composition of the present invention contains at least one selected from the group consisting of carboxylates, nitrates and sulfates of lanthanoids (but, except for cerium); at least one selected from the group consisting of carboxylates, nitrosyl carboxylates, nitrosyl nitrates and nitrosyl sulfates of ruthenium, iridium or rhodium; and a solvent containing at least one selected from the group consisting of carboxylic acids, alcohols and ketones.
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