Invention Grant
- Patent Title: Optical substrates having light collimating and diffusion structures
- Patent Title (中): 具有光准直和扩散结构的光学基片
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Application No.: US14469572Application Date: 2014-08-26
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Publication No.: US09180609B2Publication Date: 2015-11-10
- Inventor: Ching-An Yang , Wei-Tai C.-I. Chiu , Han-Tsung Pan , Lung-Pin Hsin , Yu-Mei Juan
- Applicant: UBRIGHT OPTRONICS CORPORATION
- Applicant Address: TW Taoyuan County
- Assignee: UBright Optronics Corporation
- Current Assignee: UBright Optronics Corporation
- Current Assignee Address: TW Taoyuan County
- Agency: Litron Patent & Trademark Office
- Agent Min-Lee Teng
- Main IPC: G02F1/335
- IPC: G02F1/335 ; B29C33/42 ; B29D11/00 ; G02F1/1335 ; G02B3/00 ; F21V8/00 ; G02B5/02 ; B29L11/00

Abstract:
This invention discloses a method of forming an uneven structure on a substrate. Cut a plurality of trenches in an order on a surface of a mold through a control system, wherein the plurality of trenches comprise at least one first trench, wherein for any second trench of the at least one first trench, the second trench overlaps with at least one third trench different from the second trench such that the second trench is cut off by the at least one third trench. Use the surface of the mold to emboss a thin film on the substrate to form the uneven structure.
Public/Granted literature
- US20140367873A1 Optical substrates having light collimating and diffusion structures Public/Granted day:2014-12-18
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