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发明授权
US09181386B2 Polishing pad, manufacturing method therefor, and method for manufacturing a semiconductor device 有权
抛光垫及其制造方法以及半导体装置的制造方法

Polishing pad, manufacturing method therefor, and method for manufacturing a semiconductor device
摘要：
A polishing pad having a polishing layer comprising a thermoset polyurethane foam, wherein the thermoset polyurethane foam contains, as raw material components, an isocyanate component, and active-hydrogen-containing compounds, and the active-hydrogen-containing compounds comprise one or more polyol compounds (each) having two or more functional groups, and a monool compound having one functional group.
摘要（中）：

一种抛光垫，其具有包含热固性聚氨酯泡沫的抛光层，其中所述热固性聚氨酯泡沫以含有异氰酸酯组分和含活性氢的化合物为原料成分，所述含活性氢化合物包含一种或多种多元醇 具有两个或更多个官能团的化合物（各自）和具有一个官能团的一元醇化合物。

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