Invention Grant
- Patent Title: Optical system of a microlithographic projection exposure apparatus
- Patent Title (中): 微光刻投影曝光装置的光学系统
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Application No.: US14468646Application Date: 2014-08-26
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Publication No.: US09182677B2Publication Date: 2015-11-10
- Inventor: Frank Schlesener , Ingo Saenger
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102012205045 20120329
- Main IPC: G02B27/54
- IPC: G02B27/54 ; G03F7/20 ; G02B5/30

Abstract:
An optical system of a microlithographic projection exposure apparatus comprises at least one mirror arrangement, having a plurality of mirror elements which are adjustable independently of one another for varying an angular distribution of the light reflected by the mirror arrangement, a polarization-influencing optical arrangement, by which, for a light beam passing through during the operation of the projection exposure apparatus, different polarization states can be set via the light beam cross section, and a retarder arrangement, which is arranged upstream of the polarization-influencing optical arrangement in the light propagation direction and at least partly compensates for a disturbance of the polarization distribution that is present elsewhere in the projection exposure apparatus, wherein the polarization-influencing optical arrangement has optical components which are adjustable in their relative position with respect to one another, wherein different output polarization distributions can be produced by this adjustment in conjunction with the mirror arrangement.
Public/Granted literature
- US20150029480A1 OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS Public/Granted day:2015-01-29
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